发明名称 PATTERN MEASURING METHOD, PATTERN MEASURING APPARATUS, AND RECORDING MEDIUM
摘要 <p>In measuring pattern with large process fluctuation, correct measurement cannot be carried out if noises, such as pattern that is not the subject to be measured, and dirt, are present in periphery of pattern to be measured in previously registered measurement region. Among the image data of sample, predetermined region aligned by pattern matching is set as region not to be measured that is excluded from subjects of pattern measurement. For example, in measuring pattern with large process fluctuation, only region including pattern with small process fluctuation is used in pattern matching, while in measuring the pattern, predetermined region, which was used in pattern matching and aligned, is set as region not to be measured. Stable pattern measurement can be easily carried out with respect to pattern with large process fluctuation, without being affected by region where measurement region and region not to be measured overlap with each other.</p>
申请公布号 KR101417696(B1) 申请公布日期 2014.07.09
申请号 KR20137010543 申请日期 2011.10.14
申请人 发明人
分类号 G01B15/04;H01L21/66 主分类号 G01B15/04
代理机构 代理人
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