发明名称 |
Methods and apparatus for controlling temperature of a multi-zone heater in a process chamber |
摘要 |
Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination. |
申请公布号 |
US8772682(B2) |
申请公布日期 |
2014.07.08 |
申请号 |
US201313874603 |
申请日期 |
2013.05.01 |
申请人 |
Applied Materials, Inc. |
发明人 |
Ambal Hari Kishore;Haller Uwe Paul;Zhou Jianhua |
分类号 |
H05B3/06;C23C16/00 |
主分类号 |
H05B3/06 |
代理机构 |
Moser Taboada |
代理人 |
Moser Taboada ;Taboada Alan |
主权项 |
1. An apparatus, comprising:
a multizone heater disposed in a substrate support; a power source providing a first power feed to a first zone of the multizone heater and providing a second power feed to a second zone of the multizone heater; a resistance measuring device coupled to the first power feed to simultaneously measure the current and voltage drawn by the first zone; and a controller coupled to the power source and the resistance measuring device to control the power source in response to data received from the resistance measuring device. |
地址 |
Santa Clara CA US |