发明名称 Methods and apparatus for controlling temperature of a multi-zone heater in a process chamber
摘要 Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
申请公布号 US8772682(B2) 申请公布日期 2014.07.08
申请号 US201313874603 申请日期 2013.05.01
申请人 Applied Materials, Inc. 发明人 Ambal Hari Kishore;Haller Uwe Paul;Zhou Jianhua
分类号 H05B3/06;C23C16/00 主分类号 H05B3/06
代理机构 Moser Taboada 代理人 Moser Taboada ;Taboada Alan
主权项 1. An apparatus, comprising: a multizone heater disposed in a substrate support; a power source providing a first power feed to a first zone of the multizone heater and providing a second power feed to a second zone of the multizone heater; a resistance measuring device coupled to the first power feed to simultaneously measure the current and voltage drawn by the first zone; and a controller coupled to the power source and the resistance measuring device to control the power source in response to data received from the resistance measuring device.
地址 Santa Clara CA US