| 摘要 |
An objective of the present invention is to clean a surface of a substrate at a high level of cleanness by utilizing inherent cleaning characteristics of two-fluid jet cleaning. The present invention includes: a substrate holding and supporting device (40) for holding and supporting a substrate to rotate the substrate in a state that the surface of the substrate is directed upward; a two-fluid nozzle (46) for spraying two-fluid jet streams of gas and fluid to the surface of the substrate (W) held and supported by the substrate holding and supporting device (40) downwards; and a transport unit (48) for transporting the two-fluid nozzle (46) in one direction from the center of the substrate held and supported by the substrate holding and supporting device (40) toward the outside. The two-fluid nozzle (46) is slantingly installed so that the angle forming a vertical line to a center spray line of the two-fluid jet stream sprayed from the two-fluid nozzle is the inclination angleα. Therefore, the two-fluid jet stream is configured to impact a front of the substrate when viewed in the direction of progression of the two-fluid nozzle (46). |
