| 摘要 |
A method of generating a highly ionized plasma in a plasma chamber (2), comprises the steps of:
a. providing a neutral gas to be ionized in the plasma chamber (2) at pressure below 50 Pa;
b. supplying at least one high energy high power electrical pulse with power equal or larger than 100 kW and energy equal or larger than 10 J, to at least one magnetron cathode in connection with a target in the plasma chamber (2)
c. producing a highly ionized plasma from the neutral gas in a plasma volume such that the plasma volume cross section increases during a current rise period,
d. sputtering atoms from the target with the highly ionized plasma,
e. ionizing at least part of the sputtered atoms. |
