Manufacturing techniques for workpieces with varying topographies

摘要

Some embodiments relate to a method for processing a workpiece. In the method, an anti-reflective coating layer is provided over the workpiece. A first patterned photoresist layer, which has a first photoresist tone, is provided over the anti-reflective coating layer. A second patterned photoresist layer, which has a second photoresist tone opposite the first photoresist tone, is provided over the first patterned photoresist layer. An opening extends through the first and second patterned photoresist layers to allow a treatment to be applied to the workpiece through the opening. Other embodiments are also disclosed.

主权项

1. A method for processing a workpiece having a higher topography region and a lower topography region, the method comprising:
providing an anti-reflective coating layer over the workpiece; providing a first patterned photoresist layer having a first photoresist tone over the anti-reflective coating layer; providing an un-patterned second photoresist layer over the first patterned photoresist layer; and patterning the un-patterned second photoresist layer after the second photoresist layer has been provided over the first patterned photoresist layer, wherein the second photoresist layer has a second photoresist tone opposite the first photoresist tone and wherein an opening extending through the first and second patterned photoresist layers allows a treatment to be applied to the workpiece through the opening.