METHOD FOR FORMING HARD COATING

摘要

Disclosed is a method for forming a hard coating for having a beautiful surface and high density and reducing a large particle by cleaning a substrate and controlling the degree of vacuum. According to the present invention, the method for forming a hard coating is as follows: mounting a base material on which a hard coating is deposited on a deposition device; injecting inert gas and reaction gas into the deposition device; generating plasma ion using an arc source while a pressure in the deposition device and the amount of the reaction gas are controlled; forming a first coating on the base material and cleaning the surface of the base material by making the plasma ion to collide to the surface of the base material by applying a bias voltage to the base material; and forming a second coating on the first coating by reducing the bias voltage applied to the base material.