Exhaust unit, exhaust method using the exhaust unit, and substrate processing apparatus including the exhaust unit

摘要

A substrate processing apparatus includes a chamber having an inner space where a process is carried out with respect to a substrate and an exhaust unit for exhausting substance in the inner space to the outside. The exhaust unit includes a first exhaust plate located at an upstream of an exhaust path of the substance, the first exhaust plate having first exhaust holes, and a second exhaust plate located at a downstream of the exhaust path, the first exhaust plate having second exhaust holes. The first exhaust plate is disposed outside a support member, and the second exhaust plate is disposed below the first exhaust plate generally in parallel to the first exhaust plate. The exhaust unit further includes first covers for selectively opening and closing the first exhaust holes and second covers for selectively opening and closing the second exhaust holes.

主权项

1. A substrate processing apparatus comprising:
a chamber having an inner space where a process is carried out with respect to a substrate; a support member disposed in the chamber for supporting the substrate; and an exhaust unit for exhausting substance in the inner space to the outside, wherein the exhaust unit comprises:
a first exhaust plate located at an upstream of an exhaust path of the substance, the first exhaust plate having a first opening in which the support member is installed and a plurality of first exhaust holes that are arranged to surround the first opening, the substance being exhausted through the first exhaust holes;a second exhaust plate located at a downstream of the exhaust path, the second exhaust plate having a second opening in which the support member is installed and a plurality of second exhaust holes that are arranged to surround the second opening, the substance being exhausted through the second exhaust holes;a plurality of first covers being separated from each other, some of the first covers being removed from the top surface of the first exhaust plate, respectively, to open some of the first exhaust holes so that the substance can be exhausted through some of the first exhaust holes, the remaining first covers being coupled to the top surface of the first exhaust plate, respectively, to close the remaining first exhaust holes so that the substance cannot be exhausted through the remaining first exhaust holes, in order that the uniformity of the process can be secured; anda plurality of second covers being separated from each other, some of the second covers being removed from the top surface of the second exhaust plate, respectively, to open some of the second exhaust holes so that the substrate can be exhausted through some of the second exhaust holes, the remaining second covers being coupled to the top surface of the second exhaust plate, respectively, to close the remaining second exhaust holes so that the substance cannot be exhausted through the remaining second exhaust holes, in order that the uniformity of the process can be secured,wherein the first exhaust holes comprise: first inside exhaust holes arranged on a concentric circle about a center of the first exhaust plate; and first outside exhaust holes disposed outside the first inside exhaust holes, the first outside exhaust holes being arranged on another concentric circle about the center of the first exhaust plate, wherein the second exhaust holes comprise: second inside exhaust holes arranged on a concentric circle about a center of the second exhaust plate; and second outside exhaust holes disposed outside the second inside exhaust holes, the second outside exhaust holes being arranged on another concentric circle about the center of the second exhaust plate.