Optical lithography using graphene contrast enhancement layer

摘要

Technologies are generally described for methods, systems, and structures that include patterns formed by optical lithography. In some example methods, a photoresist layer is applied to a substrate, and a grapheme layer can be applied to the photoresist layer. Light can be applied through a mask to the graphene layer, where the mask includes a pattern. The light can form the pattern on the graphene layer such that the pattern forms on the photoresist layer.

主权项

1. A system effective to form a structure, the system comprising:
a processor; a light source arranged in communication with the processor; a mask, wherein the mask includes a pattern; a substrate; a photoresist layer on the substrate; and a graphene layer on the photoresist layer; wherein the processor is configured effective to:
apply light through the mask to the graphene layer, wherein the light is effective to form the pattern on the photoresist layer though the graphene layer; andremove the graphene layer from the photoresist layer with use of a dry etching technique.