APPARATUS FOR MEASURING LOAD IMPEDANCE OF PLASMA CHAMBER

摘要

Disclosed is an apparatus for measuring a load impedance in a plasma chamber. The apparatus for measuring the load impedance in the plasma chamber according to an embodiment of the present invention comprises the plasma chamber provided for a manufacturing process of a semiconductor and a flat panel display; a main power supply for supplying power supply to the plasma chamber; an additional power supply unit for supplying the power different from the power supplied from the main power supply unit in order to measure the load of the plasma chamber; and a measuring unit provided for measuring the load of the plasma chamber by using the power supplied from the additional power supply unit. Therefore, the present invention can measure the impedance value of the plasma chamber easily and also reduce overall costs.