发明名称 |
Method and apparatus for backside illumination sensor |
摘要 |
Methods and apparatus for a backside illuminated (BSI) image sensor device are disclosed. A BSI sensor device is formed on a substrate comprising a photosensitive diode. The substrate may be thinned at the backside, then a B doped Epi-Si(Ge) layer may be formed on the backside surface of the substrate. Additional layers may be formed on the B doped Epi-Si(Ge) layer, such as a metal shield layer, a dielectric layer, a micro-lens, and a color filter. |
申请公布号 |
US8772899(B2) |
申请公布日期 |
2014.07.08 |
申请号 |
US201213409924 |
申请日期 |
2012.03.01 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
JangJian Shiu-Ko;Hong Min Hao;Chen Kei-Wei;Wang Ying-Lang |
分类号 |
H01L31/00;H01L31/02 |
主分类号 |
H01L31/00 |
代理机构 |
Slater and Matsil, L.L.P. |
代理人 |
Slater and Matsil, L.L.P. |
主权项 |
1. A backside illuminated (BSI) sensor device, comprising:
a substrate with a front side and a backside; a photosensitive diode within the substrate, the photosensitive diode being positioned along the front side of the substrate; and a B doped Epi-Si(Ge) layer on a surface of the backside of the substrate, wherein the B doped Epi-Si(Ge) layer comprises silicon and germanium. |
地址 |
Hsin-Chu TW |