发明名称 Method and apparatus for backside illumination sensor
摘要 Methods and apparatus for a backside illuminated (BSI) image sensor device are disclosed. A BSI sensor device is formed on a substrate comprising a photosensitive diode. The substrate may be thinned at the backside, then a B doped Epi-Si(Ge) layer may be formed on the backside surface of the substrate. Additional layers may be formed on the B doped Epi-Si(Ge) layer, such as a metal shield layer, a dielectric layer, a micro-lens, and a color filter.
申请公布号 US8772899(B2) 申请公布日期 2014.07.08
申请号 US201213409924 申请日期 2012.03.01
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 JangJian Shiu-Ko;Hong Min Hao;Chen Kei-Wei;Wang Ying-Lang
分类号 H01L31/00;H01L31/02 主分类号 H01L31/00
代理机构 Slater and Matsil, L.L.P. 代理人 Slater and Matsil, L.L.P.
主权项 1. A backside illuminated (BSI) sensor device, comprising: a substrate with a front side and a backside; a photosensitive diode within the substrate, the photosensitive diode being positioned along the front side of the substrate; and a B doped Epi-Si(Ge) layer on a surface of the backside of the substrate, wherein the B doped Epi-Si(Ge) layer comprises silicon and germanium.
地址 Hsin-Chu TW