| 摘要 |
Suggested are an apparatus of manufacturing an LED susceptor which prevents the etching of an inner flow path by simply and completely forming a SiC layer in the inner flow path, and a method of fabricating a susceptor using the same. The apparatus and the method supply a silicon precursor into the flow path of the susceptor which is made of graphite, to form a SiC layer on the inner surface of the inner flow path. |
