发明名称 Superjunction structures for power devices and methods of manufacture
摘要 A power device includes a semiconductor substrate having a plurality of alternately arranged pillars of first and second conductivity types. At least one of the plurality of pillars of second conductivity type includes a first trench epitaxial layer of the second conductivity type disposed on a trench sidewall of the second trench and a trench bottom surface of the second trench, a second trench epitaxial layer of the second conductivity type disposed on the first trench epitaxial layer of the second conductivity type, and an insulating material layer disposed on the second trench epitaxial layer of the second conductivity type.
申请公布号 US8772868(B2) 申请公布日期 2014.07.08
申请号 US201113095670 申请日期 2011.04.27
申请人 Fairchild Semiconductor Corporation 发明人 Yedinak Joseph A.;Rinehimer Mark L.;Shenoy Praveen Muraleedharan;Yilmaz Hamza;Pan James;Ridley, Sr. Rodney S.
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
主权项 1. A power device comprising: a semiconductor substrate of a first conductivity type; an epitaxial layer of the first conductivity type disposed on the semiconductor substrate; a first trench disposed in the epitaxial layer of the first conductivity type; a second trench disposed in the epitaxial layer of the first conductivity type; and a mesa disposed between the first trench and the second trench, the mesa defining a pillar of the first conductivity type from the epitaxial layer of the first conductivity type; a body region of a second conductivity type disposed in the epitaxial layer of the first conductivity type; a source region of the first conductivity type disposed in the body region; a gate electrode disposed on the body region and disposed on at least a portion of the source region, the gate electrode being insulated from the body region and the source region; and a source metal layer in electrical contact with the source region, the first trench including a first pillar of the second conductivity type, the second trench including a second pillar of the second conductivity type, the second pillar of the second conductivity type including: a first trench epitaxial layer of the second conductivity type disposed on a trench sidewall of the second trench and a trench bottom surface of the second trench,a second trench epitaxial layer of the second conductivity type disposed on the first trench epitaxial layer of the second conductivity type, andan insulating material layer disposed on the second trench epitaxial layer of the second conductivity type, the first pillar of the second conductivity type and the second pillar of the second conductivity type forming pillars of alternating conductivity type with the pillar of the first conductivity type.
地址 San Jose CA US