| 摘要 |
In a substrate processing apparatus (10), a temperature of an anti-static liquid, having electrical resistivity which gradually decreases as a liquid temperature increases, is adjusted by a temperature adjustment part (61) and the electrical resistivity of the anti-static liquid gets higher than the electrical resistivity of a processing liquid (sulfuric acid/hydrogen peroxide mixture solution (SPM) liquid) used for processing in a sheet-fed processing apparatus (1). The anti-static liquid is stored in an anti-static liquid storage part (71). After that, a plurality of substrates (9) supported in a cartridge (73) are immersed in the anti-static liquid inside the anti-static liquid storage part (71) and both main surfaces of each substrate (9) entirely come into contact with the anti-static liquid. This gradually removes static electricity from the substrate (9). Then, the SPM liquid is supplied onto an upper surface (91) of the substrate (9) in the sheet-fed processing apparatus (1) to thereby perform an SPM process after drying is completed by an anti-static process and a substrate drying unit (75). In the SPM process, it is thereby possible to prevent a large amount of electric charges from sharply moving from the substrate (9) to the SPM liquid and prevent any damage to the substrate (9). |
