发明名称 |
ACID GENERATORS AND PHOTORESISTS COMPRISING SAME |
摘要 |
<p>Provided are acid generator compounds that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a second onium salt acid generator that 1) comprises a covalently bound acid-labile moiety and 2) produces a second acid upon exposure of the photoresist composition to activating radiation, wherein the first acid and second acid have pKa values that differ by at least 0.5.</p> |
申请公布号 |
KR20140086904(A) |
申请公布日期 |
2014.07.08 |
申请号 |
KR20130165457 |
申请日期 |
2013.12.27 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
THACKERAY JAMES W.;LABEAUME PAUL J.;CAMERON JAMES F. |
分类号 |
G03F7/029;G03F7/004;G03F7/26;H01L21/027 |
主分类号 |
G03F7/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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