发明名称 Induced plasma for EUV light generated gas cell
摘要 PURPOSE: A plasma induced gas cell for extreme ultraviolet light generation is provided to generate optimum EUV light through plasma induction using a source light and a reaction gas. CONSTITUTION: A light induction furnace (110) is formed in both sides along the length direction of a main body. A plasma induction furnace (120) is located between the light induction furnaces. A gas injection path (130) is comprised to be connected to the plasma induction furnace. The gas injection path supplies a plasma reaction gas supplied from the outside. A gas ventilation path (140) ventilates the gas existing in the plasma induction furnace to the outside.
申请公布号 KR101416267(B1) 申请公布日期 2014.07.08
申请号 KR20120028462 申请日期 2012.03.20
申请人 发明人
分类号 G03F7/20;G21K5/00;H01L21/027;H05G2/00 主分类号 G03F7/20
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