Retaining ring for chemical mechanical polishing

摘要

A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.

主权项

1. A retaining ring for a carrier head having a mounting surface for a substrate, comprising:
a generally annular first portion having a top surface and a bottom surface configured for contacting a polishing pad during chemical mechanical polishing, wherein the first portion is a plastic first material and wherein the first portion lacks any channel between the top surface and the bottom surface of the first portion; and a generally annular second portion having a lower surface that extends over at least a portion of the first portion and an upper surface configured to be mechanically affixed to and abut a rigid base of a carrier head, wherein the upper surface includes a hole configured to receive a fastener to mechanically affix the retaining ring to the base, wherein the first portion is fixed directly to the second portion without a removable mechanical fastener, and wherein the second portion is a second material which is more rigid than the first material.