发明名称 |
METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE, ELECTRO OPTICAL DEVICE AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electrooptical device, an electrooptical device and electronic equipment capable of improving yield and quality of a substrate for an electrooptical device with high light utilization efficiency.SOLUTION: A method for manufacturing an element substrate including a pixel electrode 28 and a TFT 24 for supplying an electric signal to the pixel electrode 28 includes the steps of: forming a groove 12 on a first surface 11a of a substrate 11 having optical transparency; forming a sealing layer 10 having optical transparency so as to close an opening part 12c of the groove 12 by covering the first surface 11a of the substrate 11; and forming the TFT 24 on the sealing layer 10. It includes a step of forming a transparent layer 17 having optical transparency on a second surface 11b on the opposite side of the first surface 11a of the substrate 11 before the step of forming the TFT 24. |
申请公布号 |
JP2014126574(A) |
申请公布日期 |
2014.07.07 |
申请号 |
JP20120280696 |
申请日期 |
2012.12.25 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ITO SATOSHI |
分类号 |
G09F9/30;G02F1/1333;G02F1/1335;G02F1/1368;G09F9/00;H01L51/50;H05B33/02;H05B33/04;H05B33/10;H05B33/28 |
主分类号 |
G09F9/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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