发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTROOPTICAL DEVICE, ELECTRO OPTICAL DEVICE AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electrooptical device, an electrooptical device and electronic equipment capable of improving yield and quality of a substrate for an electrooptical device with high light utilization efficiency.SOLUTION: A method for manufacturing an element substrate including a pixel electrode 28 and a TFT 24 for supplying an electric signal to the pixel electrode 28 includes the steps of: forming a groove 12 on a first surface 11a of a substrate 11 having optical transparency; forming a sealing layer 10 having optical transparency so as to close an opening part 12c of the groove 12 by covering the first surface 11a of the substrate 11; and forming the TFT 24 on the sealing layer 10. It includes a step of forming a transparent layer 17 having optical transparency on a second surface 11b on the opposite side of the first surface 11a of the substrate 11 before the step of forming the TFT 24.
申请公布号 JP2014126574(A) 申请公布日期 2014.07.07
申请号 JP20120280696 申请日期 2012.12.25
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI
分类号 G09F9/30;G02F1/1333;G02F1/1335;G02F1/1368;G09F9/00;H01L51/50;H05B33/02;H05B33/04;H05B33/10;H05B33/28 主分类号 G09F9/30
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