发明名称 LIQUID JET HEAD AND LIQUID JET APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a liquid jet head and a liquid jet apparatus that can suppress leakage of a liquid, a defect in discharging of droplets, and peeling of a laminated substrate by suppressing a silicon substrate from being eroded with a liquid.SOLUTION: A liquid jet head comprises: at least a nozzle plate 20 provided with nozzle openings 21 for discharging a liquid; and a flow passage formation substrate 10 provided with a pressure generation chamber 12 communicating the nozzle openings 21. The nozzle plate 20 is formed of a silicon substrate, and at least the flow passage formation substrate 10 and nozzle plate 20 are joined together after films 201, 203 including at least one of a hafnium oxide film and a zirconium oxide film formed through atomic layer deposition are provided over the entire surfaces including joint surfaces.</p>
申请公布号 JP2014124883(A) 申请公布日期 2014.07.07
申请号 JP20120284505 申请日期 2012.12.27
申请人 SEIKO EPSON CORP 发明人 NAKAMURA CHUYA ; NAITO NOBUHIRO ; NAGATOYA MASARU ; WAKAMATSU KOSUKE
分类号 B41J2/045;B41J2/055;B41J2/16 主分类号 B41J2/045
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