| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel epoxide derivative as an ingredient of a photoacid generator and a (meth)acrylic acid ester derivative for use in a semiconductor photoresist composition.SOLUTION: The present invention provides an epoxide derivative of the formula (1). (In the formula, R, R, R, R, R, R, R, R, R, Rand Rrepresent H, a C1-6 alkyl group, a C3-10 cycloalkyl group, or a C1-4 alkoxy group; Rand Rrepresent H, a C1-6 alkyl group, a C3-10 cycloalkyl group or a C1-4 alkoxy group, or are combined with each other to form an alkylene group, -O-, or -S-; Rrepresents H, a C1-6 alkyl group, a C3-10 cycloalkyl group, a C1-4 alkoxy group, or the like; X represents -O- or >N-R, where Ris H or a C1-6 alkyl group; Y represents >C=O or the like; and the wavy lines indicate that one of Rand Rcan be endo or exo.) |
