| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a polishing liquid for electronic materials in a range of weakly acidic to alkaline compared with conventional strongly acidic polishing liquids, having little corrosion of a device in a polishing process in a manufacturing process of electronic materials, capable of easily removing polishing chips generated by polishing in a following washing process, and further maintaining polishing speed in a polishing process, and to provide a method of polishing electronic material intermediates by using the polishing slurry for electronic materials, and a method of manufacturing electronic materials including a process of polishing the electronic material intermediates by the method of polishing.SOLUTION: There is provided a polishing liquid for electronic materials containing one or more kinds of organic amine selected from a group containing of alkanolamine and alkylamine (D) and polishing particles (C) as essential components and having pH of 4 to 11.</p> |
