| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electronic material polishing liquid capable of washing easily after polishing and having higher rinse property compared to conventional polishing liquid in a polishing process in a producing process of an electronic material, a polishing method of polishing an electronic material intermediate body using the electronic material polishing liquid, and a producing method of an electronic material including a polishing process of the electronic material intermediate body using the same polishing method.SOLUTION: The electronic material polishing liquid includes antirust (A) having surface tension equal to or less than 50 mN/m at 25°C in water dilution liquid of 1%.</p> |
