DEPOSITION APPARATUS AND FILM FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To improve efficiency in the use of a material gas in film formation and inhibit a drop or adhesion of a reaction product to a deposition target substrate.SOLUTION: In an inner space of a housing chamber 100 for housing a substrate, a material gas Gs is supplied from a lateral of the substrate along an X direction; and a first block gas Gb1 and a second block gas Gb 2 for inhibiting floating of the material gas Gs in a Z direction are supplied from an upstream side in the X direction from the substrate; and a third block gas Gb3 for inhibiting floating of the material gas Gs in the Z direction is supplied from immediately above the substrate; and a fourth block gas Gb4 for inhibiting floating of the material gas Gs in the Z direction and introducing the material gas Gs and the like to an exhaust port provided on a downstream side in the X direction and down below the internal space 100a is supplied from a downstream side in the X direction from the substrate.