发明名称 |
VAPOR DEPOSITION MASK, AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition mask improved in an opening pattern shape and location accuracy.SOLUTION: A vapor deposition mask includes: a resin film 2 in which an opening pattern 6 with the same dimensions as that of a thin film pattern to be deposited on a substrate is formed; and a thin-plate type magnetic metal member 1 through which a through hole 4 is provided, of which size includes the opening pattern 6. The vapor deposition mask has a structure in which the resin film 2 and the thin-plate type film 2 contact tightly. A dummy through hole 5 is provided in a region of the magnetic metal member 1, other than the an evaporation effective region which includes the through hole 4. A dummy opening pattern 7 is provided to control deformation of the opening pattern 6 and the through hole 4, the deformation being caused by difference in thermal expansion between the film 2 and the magnetic metal member 1. |
申请公布号 |
JP2014125671(A) |
申请公布日期 |
2014.07.07 |
申请号 |
JP20120284936 |
申请日期 |
2012.12.27 |
申请人 |
V TECHNOLOGY CO LTD;DAINIPPON PRINTING CO LTD |
发明人 |
MIZUMURA MICHINOBU;KUDO SHUJI;OBATA KATSUYA |
分类号 |
C23C14/04;H01L51/50;H05B33/10 |
主分类号 |
C23C14/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|