PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM PHOTORESIST FORMED THEREOF

摘要

The present invention relates to a photosensitive resin composition and a dry film photoresist manufactured therefrom and, more specifically, provides a photosensitive resin composition and a dry film photoresist manufactured therefrom, which have enhanced chemical resistance, thereby being stable for plating and etching processes; and can work as a resist for an alkali etching solution which is conventionally lack of tolerance, thereby facilitating manufacturing of various shaped boards which were impossible by conventional processes.