| 摘要 |
The present invention relates to a substrate processing device. The substrate processing device according to an embodiment of the present invention includes a process chamber; an electrolyzer which is connected to a pure water line supplying pure water and an electrolyte line supplying electrolyte and generates electrolytic ion water by electrolyzing the pure water and the electrolyte solution; a cleaning fluid line which supplies the electrolytic ion water generated in the electrolyzer to the process chamber; and a cleaning fluid circulation line which is branched from the cleaning fluid line. |
