| 摘要 |
The present invention provides a method of cleaning a thin film forming apparatus, which is capable of cleaning the apparatus suitably depending on a condition of the apparatus, a thin film forming method, a thin film forming apparatus, and a recording medium. The method of cleaning a heat treatment apparatus (1) includes a first cleaning process for supplying cleaning gas into a reaction tube (2) to remove extraneous particles attached to an interior of the apparatus (1) when a first cleaning start conditions is satisfied; and a second cleaning process of supplying a cleaning gas different from the cleaning gas of the first cleaning process into the reaction tube (2) to remove extraneous particles attached to the interior of the apparatus (1) when a second cleaning start condition that is different from the first cleaning start condition is satisfied. |
