DEPOSITION APPARATUS AND FILM MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To inhibit a drop or adhesion of a reaction product to a deposition target substrate.SOLUTION: In a deposition apparatus, to a substrate housed in an internal space of a housing chamber 100, a material gas Gs is supplied from a lateral of the substrate along an X direction; a third block gas Gb3 is supplied from immediately above the substrate along a -Z direction at a third block gas flow rate and a fourth block gas Gb4 is supplied from a downstream side in the X direction from the substrate and from above along the -Z direction at a fourth block gas flow rate faster than the third block gas flow rate; a second block gas Gb2 is supplied from an upstream side in the X direction from the substrate and from above along the -Z direction at a second block gas flow rate between the third block gas flow rate and the fourth block gas flow rate; and a first bloc gas Gb1 is supplied from an upstream side in the X direction from the substrate and from above along the X direction at a first block gas flow rate faster than each of the second block gas flow rate to the fourth block gas flow rate.