| 摘要 |
A gas treatment apparatus according to an embodiment of the present invention includes: gas piping where a water sealed valve is provided and blast furnace gas flows; a liquid supply line that is connected to the water sealed valve and supplies a working liquid to the water sealed valve; an overflow line that is connected to an upper portion of the water sealed valve and discharges the working liquid which overflows from the water sealed valve outward; a drain line that is connected to a lower portion of the water sealed valve and drains the working liquid from the water sealed valve; a seal pot that is connected to the overflow line and the drain line and stores the working liquid; an exhaust pipe that is connected to the seal pot and discharges gas from the seal pot; and a filter box that is connected to the exhaust pipe and filters the gas. The filter box has: a housing that has an upper accommodating space and a lower accommodating space; a filter that can be accommodated in the upper accommodating space; and a demister and a sealing pad that can be selectively accommodated in the lower accommodating space. |
