发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT BLOCKING LAYER USING THE SAME
摘要 <p>Provided are (A) a photopolymerization initiator including a compound represented by chemical formula 1; (B) a binder resin; (C) a photopolymerizable monomer; (D) a coloring agent; and (E) a photosensitive resin composition including a solvent, and a light blocking layer using the same. [Chemical formula 1] (In chemical formula 1, each substituent is defined as in the specification.).</p>
申请公布号 KR20140083616(A) 申请公布日期 2014.07.04
申请号 KR20120153561 申请日期 2012.12.26
申请人 CHEIL INDUSTRIES INC. 发明人 WOO JI WON
分类号 G03F7/028;G02B5/20;G03F7/004 主分类号 G03F7/028
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