| 摘要 |
Provided is a decompression drying apparatus which is difficult to cause residue defects in a substrate due to a solvent component made into droplets. The decompression drying apparatus (1) supplies nitrogen into a chamber (10) through an open air inlet (one-sided air inlet) in a space area of one side (+Y side) in a horizontal direction as viewed from the center of a substrate G after decompression drying treatment. For this reason, an atmosphere of a positive pressure is formed in the space area of the +Y side where the air inlet is positioned right after the supply of air. As a result, an air current flowing on a first main surface S1 side of the substrate G among air currents AF2 generated in the chamber (10) by the supply of air becomes a one-way air current moving from the +Y side to a -Y side. This decreases the possibility that a pressure concentrated area PD occurs on the first main surface S1 side of the substrate G, wherein the pressure concentrated area PD is a portion where the pressure is instantaneously increased as the air currents AF2 generated in the chamber (10) collide with each other in a pressure restoring process. This is, the risk of residue defects can be reduced, wherein the risk is that the droplets of the solvent component generated in the pressure concentrated area PD are attached to the first main surface S1 side of the substrate G. |
