| 摘要 |
A method of fabricating a component including a wafer for use in a watch includes depositing a first thin film (301) onto the wafer (300), the first thin film being adapted to allow light reflected away from the wafer to be indicative of a first colour characteristic. The first thin film (301) may include silicon nitride and have a refractive index greater than 2. The method may also include defining a pattern (12, 13) on the first thin film (301) using photolithography and processing a region within a boundary of the pattern, e.g. by depositing a metal or a ceramic material within the boundary of the pattern, so that the region allows light reflected away from the wafer (300) to be indicate of a second colour characteristic. |
