| 摘要 |
The present invention relates to a deposition device and, more specifically, to a deposition device capable of monitoring the remaining amount of deposition materials. According to an embodiment of the present invention, the deposition device includes: a heating chamber; a furnace installed on the heating chamber and used to accommodate the deposition materials; and one or more measuring devices whereby one measuring unit is installed in the furnace. A temperature measuring device is used to monitor the deposition materials in the furnace by measuring the temperature of the deposition materials and the furnace. |
