| 摘要 |
Provided are a novel noium salt compound which is helpful in forming monomers of an acid amplifier, an acid amplifier containing repetitive units derived therefrom, and a resist composition comprising same. The noium salt compound has a structure described in Formula 1. The acid amplifier containing repetitive units derived therefrom, when being used as an additive during preparing a resist, shows a high acid yield in the same photosensibility, thereby raising the photosensibility of the resist and forming finest corrosion patterns having excellent photosensibility and distinguishability. The Formula 1 is described in the description. And in the Formula 1, all the substituent groups are the same as defined in the description. |
