| 发明名称 |
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION |
| 摘要 |
<p>The present invention relates to a monomer for a hard mask composition represented by the following formula 1, a hard mask composition including the monomer, and a method of forming a pattern using the hard mask composition. In formula 1, the definitions of A, A′, A″, L, L′and n are the same as described in the specification.</p> |
| 申请公布号 |
KR20140083695(A) |
申请公布日期 |
2014.07.04 |
| 申请号 |
KR20120153751 |
申请日期 |
2012.12.26 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
CHOI, YOO JEONG;KIM, YUN JUN;KIM, HEA JUNG;PARK, YO CHOUL;LEE, CHUNG HEON;CHO, YOUN JIN |
| 分类号 |
C07C39/12;C07C39/04;G03F7/004 |
主分类号 |
C07C39/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
