HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

摘要

The present invention relates to a hard mask composition including: compounds containing aliphatic series connected to at least one amic acid and imide-group or an aromatic ring; and a solvent and a method to form patterns using hard mask composition. Provided is the hard mask composition capable of securing solubility in the solvent, gap-fill properties, flattening properties, and capable of satisfying with heat resistance and etching resistance. The hard mask composition includes two or more aliphatic series or aromatic rings.