| 发明名称 |
RESIST COMPOSITION AND METHOD OF PRODUCING RESIST PATTERN |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables a resist pattern to be produced in a good shape and excellent line edge roughness (LER).SOLUTION: A resist composition contains a resin including a structural unit derived from a salt represented by formula (I) and an acid generator represented by formula (B1). |
| 申请公布号 |
JP2014123115(A) |
申请公布日期 |
2014.07.03 |
| 申请号 |
JP20130241075 |
申请日期 |
2013.11.21 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
SAKAMOTO HIROSHI;FURUYAMA FUMIO;ICHIKAWA KOJI |
| 分类号 |
G03F7/004;C08F220/38;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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