发明名称 DEPOSITION SYSTEMS HAVING DEPOSITION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY WITH RADIATION DEFLECTION AND RELATED METHODS
摘要 Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.
申请公布号 WO2013182880(A3) 申请公布日期 2014.07.03
申请号 WO2013IB01056 申请日期 2013.05.24
申请人 SOITEC 发明人 CANIZARES, CLAUDIO;DING, DING
分类号 C23C16/52 主分类号 C23C16/52
代理机构 代理人
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