| 发明名称 |
PHOTORESIST COMPOSITION AND METHOD FOR FORMING A METAL PATTERN |
| 摘要 |
A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer and a mixed solvent including a first solvent, a second solvent having a higher volatility than the first solvent, and a third solvent having a higher volatility than the second solvent. The coating layer is exposed to light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask. |
| 申请公布号 |
US2014183162(A1) |
申请公布日期 |
2014.07.03 |
| 申请号 |
US201313911984 |
申请日期 |
2013.06.06 |
| 申请人 |
Samsung Display Co., LTD. |
发明人 |
CHO Ki-Hyun;KANG Hoon;KIM Jae-Sung;KIM Dong-Min;KIM Seung-Ki;JEAGAL Eun |
| 分类号 |
G03F7/40;G03F7/038 |
主分类号 |
G03F7/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photoresist composition comprising:
a binder resin; a photo-sensitizer; and a mixed solvent including a first solvent, a second solvent having a higher volatility than the first solvent, and a third solvent having a higher volatility than the second solvent. |
| 地址 |
Yongin-City KR |
