| 摘要 |
A positive photosensitive composition, and a method for forming a pattern by using the composition are provided to improve pattern collapse, exposure latitude and line edge roughness when a micropattern of 100 nm or less is formed. A positive photosensitive composition comprises a compound which generates an acid by the irradiation of an active ray or a radioactive ray; and a resin which comprises a repeating unit represented by the formula I and a repeating unit represented by -L-R3 and whose dissolution velocity in an alkali developer increases by the action of an acid, wherein X_a1 is H, an alkyl group, a cyano group, or a halogen atom; R_y1, R_y2 and R_x are independently an alkyl group, or a cycloalkyl group; Z_a is an alkylene group; L is a C4-C30 divalent connecting group; and R3 is H, a hydroxyl group, or an organic group. |
