COATING SOLUTION FOR FORMING TRANSPARENT DIELECTRIC THIN FILM FOR LOW-TEMPERATURE PROCESS AND TRANSPARENT INORGANIC THIN FILM TRANSISTOR HAVING THE THIN FILM FORMED BY THE COATING SOLUTION

摘要

Provided is a coating solution for forming a transparent dielectric thin film. The coating solution is characterized by comprising: a first material containing aluminum; a second material containing zirconium; and a solvent dissolving the first material and the second material, wherein the solvent is composed of a first solvent and a second solvent.