| 发明名称 |
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD |
| 摘要 |
A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber. |
| 申请公布号 |
US2014182628(A1) |
申请公布日期 |
2014.07.03 |
| 申请号 |
US201314139746 |
申请日期 |
2013.12.23 |
| 申请人 |
EBARA CORPORATION |
发明人 |
ISHIBASHI Tomoatsu |
| 分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate cleaning apparatus, comprising:
a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber. |
| 地址 |
Tokyo JP |
