发明名称 |
ALUMINUM COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM |
摘要 |
The present invention relates to an aluminum compound represented by general formula (I). The present invention also relates to a thin film-forming raw material that contains this aluminum compound. In general formula (I), R1 and R2 each independently denote a straight chain or branched alkyl group having 2-5 carbon atoms, and R3 denotes a methyl group or ethyl group. It is preferable for R1 and R2 to be ethyl groups. This compound has a low melting point, exhibits satisfactory volatility, has high thermal stability, and is suitable for use as a raw material used to form a thin film by a CVD method. |
申请公布号 |
WO2014103588(A1) |
申请公布日期 |
2014.07.03 |
申请号 |
WO2013JP81711 |
申请日期 |
2013.11.26 |
申请人 |
ADEKA CORPORATION |
发明人 |
YOSHINO, TOMOHARU;SAKURAI, ATSUSHI;SHIRATORI, TSUBASA;HATASE, MASAKO;UCHIUZOU, HIROYUKI;NISHIDA, AKIHIRO |
分类号 |
C07F5/06;C23C16/40;H01L21/316 |
主分类号 |
C07F5/06 |
代理机构 |
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