发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN |
摘要 |
Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.) |
申请公布号 |
WO2014104400(A1) |
申请公布日期 |
2014.07.03 |
申请号 |
WO2013JP85328 |
申请日期 |
2013.12.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAWABATA, TAKESHI;TAKIZAWA, HIROO;SHIBUYA, AKINORI;GOTO, AKIYOSHI;KOJIMA, MASAFUMI;KATO, KEITA |
分类号 |
G03F7/004;C07C309/17;C07C309/19;C07C309/24;C07C311/48;C07C317/04;C07D211/06;C07D307/10;C07J31/00;G03F7/038;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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