发明名称 |
DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES |
摘要 |
Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices. |
申请公布号 |
US2014186770(A1) |
申请公布日期 |
2014.07.03 |
申请号 |
US201314145551 |
申请日期 |
2013.12.31 |
申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
AQAD Emad;XU Cheng-Bai;KAUR Irvinder;LI Mingqi;SUN Jibin;ANDES Cecily |
分类号 |
G03C1/73;G03F7/20 |
主分类号 |
G03C1/73 |
代理机构 |
|
代理人 |
|
主权项 |
1. A dendritic compound, comprising:
an anionic dendron comprising a focal point comprising an anionic group and a linking group; and a photoreactive cation. |
地址 |
Marlborough MA US |