发明名称 DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES
摘要 Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices.
申请公布号 US2014186770(A1) 申请公布日期 2014.07.03
申请号 US201314145551 申请日期 2013.12.31
申请人 Rohm and Haas Electronic Materials LLC 发明人 AQAD Emad;XU Cheng-Bai;KAUR Irvinder;LI Mingqi;SUN Jibin;ANDES Cecily
分类号 G03C1/73;G03F7/20 主分类号 G03C1/73
代理机构 代理人
主权项 1. A dendritic compound, comprising: an anionic dendron comprising a focal point comprising an anionic group and a linking group; and a photoreactive cation.
地址 Marlborough MA US