Two-Liquid Process for Synthesizing Polyurethane with High Heat-Resistance and High Abrasion-Resistance

摘要

A two-liquid process for synthesizing polyurethane with high heat-resistance and high abrasion-resistance is disclosed, which utilizes a semi-reactive polymer A solution containing hydroxyl groups and a semi-reactive polymer B solution containing poly-isocyanate groups. The polymer A and B solution are mixed for performing a second reaction and then coated on a substrate by a coating machine, and the coating layer is cured to form a polyurethane film. The semi-reactive polymer A and B solution are pre-polymerized in advance. The required polyurethane resin expands on the semi-reactive polymer A and B with a whole range of new functionality and construction styles through polymerization to produce high heat-resistant and high abrasion-resistant polyurethane film through coating facility under the working temperature about 80° C. A fabric is coupled during coating step for polyurethane leather. The two-liquid process is without using solvent as carrier. The environmental problem of air and water pollution can be resolved.

主权项

1. A two-liquid process for synthesizing polyurethane with high heat-resistance and high abrasion-resistance comprising the steps of,
making a semi-reactive polymer A solution comprising blocked hydroxyl groups and a semi-reactive polymer B solution comprising blocked isocynate groups by pre-polymeration, and adjusting the scale of A solution and B solution based on the physical demand of PU product, and mixing the A solution and B solution in a container to form a solution mixture for performing a second reaction; coating the solution mixture on a substrate to form a coating layer before the completion of the second reaction, which the solution mixture remains liquid form; curing the coating layer to form a PU film; whereby the structure of the PU film is more integrated and sturdier, and it is more convenient to produce the PU film with high heat-resistance and high abrasion-resistance properties.