| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an abrasive compound for a synthetic quartz glass substrate capable of preventing generation of defects and improving yield at the time of manufacturing a semiconductor device and the like, and to provide a manufacturing method of the synthetic quartz glass substrate.SOLUTION: There is provided an abrasive compound for a synthetic quartz glass substrate obtained by polymerizing tripeptide represented by the sequence of [Gly-Xaa-Yaa], where Xaa and Yaa represent amino acids, at least one of them is hydroxyproline and n represents a polymerization degree, as a monomer and containing a material derived from collagen which has a weight average molecular weight of 1,000 to 10 million and a change of states between a gel state and a solution state, and a colloidal solution. The invention not only prevents generation of defects detected with a high sensitive defect inspection device of a substrate surface and improves yield at the time of manufacturing during manufacturing synthetic quartz glasses such as a synthetic quartz glass substrate and the like used in an optical lithography which is important for a photomask, a nanoimprint, a magnetic disc and the like, but also leads further high definition in the semiconductor industry.</p> |
