发明名称 SEED USED FOR CRYSTALLINE SILICON INGOT CASTING
摘要 The invention discloses a seed used for crystalline silicon ingot casting. A seed according to a preferred embodiment of the invention includes a crystal and an impurity diffusion-resistant layer. The crystal is constituted by at least one grain. The impurity diffusion-resistant layer is formed to overlay an outer surface of the crystal. A crystalline silicon ingot fabricated by use of the seed of the invention has significantly reduced red zone and yellow zone.
申请公布号 US2014186631(A1) 申请公布日期 2014.07.03
申请号 US201314139641 申请日期 2013.12.23
申请人 Sino-American Silicon Products Inc. 发明人 CHOU Hung-Sheng;CHIANG Yu-Tsung;YANG Yu-Min;HSIAO Ming-Kung;YU Wen-Huai;HSU Sung-Lin;LI I-Ching;LAN Chung-Wen;HSU Wen-Ching
分类号 H01L31/18 主分类号 H01L31/18
代理机构 代理人
主权项 1. A seed, comprising: a crystal, constituted by at least one grain; and an impurity diffusion-resistant layer, formed to overlay an outer surface of the crystal.
地址 Hsinchu TW