发明名称 Method for preparing samples for transmission electron microscope analysis for various applications, involves applying pressure in region around sample during sputtering to realize maximum pressure difference between anode and cathode sides
摘要 <p>The method involves introducing a cylindrical sample (4) between an anode (1) and a cathode (2) of a Grimm sputtering source, so that portions of the sample cohesively contact with the cathode, and are insulatively mounted on a storage device (3). The sample is evacuated so as to realize an evacuation of the space in the anode and the cathode side through a piping system (5). Equal pressure is applied in a region around the entire sample during sputtering process and after the evacuation process so as to realize maximum pressure difference of 5hPa between the anode and cathode sides. The sample is in diameter of 3.0 mm, and the sample height is 1.0 mm. An independent claim is also included for a device for preparation of samples for TEM analysis.</p>
申请公布号 DE102013201977(B3) 申请公布日期 2014.07.03
申请号 DE201310201977 申请日期 2013.02.07
申请人 LEIBNITZ-INSTITUT FÜR FESTKÖRPER-UND WERKSTOFFFORSCHUNG DRESDEN E.V. 发明人 HOFFMANN, VOLKER;EFIMOVA, VARVARA;THOMAS, JÜRGEN;GEMMING, THOMAS;GRASEMANN, SAMUEL;HORST, ALEXANDER;GRUNDKOWSKI, STEFFEN;VOIGTLÄNDER, RALF
分类号 G01N1/28;G01N1/42;G01N23/00;H01J37/34 主分类号 G01N1/28
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