| 发明名称 |
SILICONE SKELETON-CONTAINING POLYMER COMPOUND, NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMATION METHOD AND COATING FOR PROTECTION OF ELECTRIC/ELECTRONIC COMPONENT |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicone skeleton-containing polymer compound to be used as a base resin of a chemical amplification type negative resist material.SOLUTION: A silicone skeleton-containing polymer compound has following repeating units. |
| 申请公布号 |
JP2014122275(A) |
申请公布日期 |
2014.07.03 |
| 申请号 |
JP20120279260 |
申请日期 |
2012.12.21 |
| 申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
TAKEMURA KATSUYA;URANO HIROYUKI;MIYAZAKI TAKASHI;ASAI SATOSHI;NAKAJIMA NAOTSUGU |
| 分类号 |
C08G77/52;G03F7/004;G03F7/038;G03F7/075;G03F7/09;G03F7/40;H01L21/027 |
主分类号 |
C08G77/52 |
| 代理机构 |
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| 主权项 |
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