POLISHING PAD PRODUCTION METHOD

摘要

This polishing pad production method includes steps for forming grooves on the surface of a polishing layer comprising a flexible polyurethane foam. The flexible polyurethane foam has an Asker D hardness of 30 or less at 25°C. The aforementioned steps include: a step 1 for adjusting the Asker D hardness of the flexible polyurethane roam to 35 or above by cooling the polishing layer; and a step 2 for forming grooves on the surface of the polishing layer comprising the flexible polyurethane foam, the Asker D hardness of which has been adjusted by cooling. The polishing pad production method enables grooves to be machined with high precision when a polishing layer of a polishing pad is flexible polyurethane foam.